Comparison ledger
EV Group 301, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 301EV Group | 1000PYES |
|---|---|---|
| OEM | EV Group | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 301 | YES 1000P |
| Specifications | ||
| Cleaning type | Aqueous-based (DI water) megasonic cleaning[1] | — |
| Spinner rotation | Up to 3000 RPM[1] | — |
| DI-water flow rate | Up to 1.5 l/min[1] | — |
| Megasonic nozzle frequency | 1 MHz[1] | — |
| Megasonic nozzle output power | 30–60 W[1] | — |
| Bonding station | Direct bonding (flat to flat) station[1] | — |
| Inspection module | IR-inspection (lamp/camera) module[1] | — |
| Environment | Class 1 mini environment with HEPA filters and ionizer[1] | — |
| Wafer diameter | 200 mm, 100 - 300 mm[2] | — |
| Cleaning system | Aqueous-based (DI water) megasonic cleaning; solvent cleaning option[1] | — |
| Pre-bonding station | Direct bonding (flat to flat) station[1] | — |
| IR-inspection module | IR-inspection (lamp/camera) module[1] | — |
| Class 1 mini environment | HEPA filters + ionizer[1] | — |
| Brush scrubbing option | Available for single-side cleaning[2] | — |
| Substrate size | 200, 100–300 mm[3] | — |
| Rotation speed | up to 3000 rpm[3] | — |
| Megasonic nozzle | frequency 1 MHz, output 30–60 W[3] | — |
| Effective cleaning area | φ4.0 mm[3] | — |
| Power supply | single‑phase 200 V, 50/60 Hz[3] | — |
| Cleaning system type | Open chamber, spinner and cleaning arm[2] | — |
| Chamber material | PP or PFA (option)[2] | — |
| Cleaning media | DI-water (standard), other (option)[2] | — |
| Spinner chuck | vacuum chuck (standard), edge handling chuck (option)[2] | — |
| Rotation | up to 3000 rpm[2] | — |
| Megasonic effective cleaning area | Ø 4.0 mm[2] | — |
| Megasonic nozzle material | PTFE[2] | — |
| Megasonic area transducer frequency | 1 MHz (3 MHz option)[2] | — |
| Megasonic area transducer output power | max. 2.5 W/cm² active areas (max. 200 W)[2] | — |
| Brush material | PVA[2] | — |
| IR-inspection | lamp/camera module[1] | — |
| Model | — | 1000P[4] |
| System type | — | Plasma cleaning system[4] |
| Shelf configuration | — | Four 16 x 16 inch shelves[4] |
| Total capacity | — | 1024 square inches[4] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[4] |
| Number of shelves | — | 4[4] |
| Shelf size | — | 16 x 16 inches[4] |
| Power | — | 1000 W[5] |
| Configuration | — | Parallel plate[5] |
| Operation modes | — | Active, RIE, Downstream[4] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[4] |
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