Comparison ledger
Despatch AST-1100, YES 12-2P-CP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | AST-1100Despatch | 12-2P-CPYES |
|---|---|---|
| OEM | Despatch | YES |
| Category | Thermal / Diffusion | Thermal / Diffusion |
| Wafer size | 300mm | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Despatch AST-1100 | YES 12-2P-CP |
| Cited variants | — | |
| Specifications | ||
| Wafer size | Designed for 300 mm silicon wafers; also suitable for 200 mm wafers[2] | 300 mm wafers[1] |
| Tool type | Automated photowhite bake tool[2] | manual-load high-temperature cure oven[3] |
| Tool capacity | 50 wafers with standard two-chamber configuration[2] | — |
| Temperature uniformity | +/-1.0 °C between wafers and across all 25 wafers in the chamber at dunk temperature[2] | — |
| Maximum temperature | 175 °C[2] | up to 450°C[1] |
| Atmosphere | Inert atmosphere[2] | — |
| Cooling | Active cooling for rapid cool down[2] | — |
| Filtration | HEPA filter[2] | — |
| Dimensions | Approximately 262 cm wide and 224 cm long[2] | — |
| Automation features | Supports two front-opening unified pod (FOUP) load stations, a class 1 cleanroom-compatible robot, and an optically based class 1 laser cassette imaging sensor[2] | — |
| Compliance | Meets SEMI S2/S8 and SEMATECH appendices A, B, and C[2] | — |
| Communication standards | Meets 300 mm SEMI communications standards[2] | — |
| Options | FOUP ID reader, 2-level monitoring, wafer ID reader, uninterruptible power supply (UPS)[2] | — |
| Model designation | — | 12-2P-CP[1] |
| Series | — | YES-PB Series / 450PB Series[1] |
| Load type | — | manual load[3] |
| Application scope | — | MEMS and semiconductor process applications[4] |
| Cooling package | — | Air-only cooling package; no water[1] |
| Airflow | — | Vertical laminar airflow[1] |
| High vacuum | — | 10-6[1] |
| Interface | — | touch screen interface[4] |
| Process applications | — | MEMS and semiconductor process applications[3] |
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