Comparison ledger
CEE 1000 Hot Plate, YES 1518, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1518YES | |
|---|---|---|
| OEM | CEE | YES |
| Category | Thermal / Diffusion | Thermal / Diffusion |
| Wafer size | — | 4-inch, 5-inch, 6-inch, 8-inch |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 1000 Hot Plate | YES 1518 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 4"[2] | — |
| Type | Hot Plate[2] | dual function[3] |
| Wafer Size | 4 inch[2] | — |
| Model | — | YES-1518[3] |
| System description | — | Our "Ultra-Clean" system[3] |
| Capacity for HMDS Prime | — | 8 cassettes of 4 in. wafers, or 1 cassette of 5-8 in. wafers[3] |
| Capacity for Image Reversal | — | 4 cassettes of 4 in. wafers, or 1 cassette of 5-8 in. wafers[3] |
| Cleanliness | — | < 1 x 1 micron particle and < 10 x 1 micron particles per 6 in. wafer[3] |
| Throughput for HMDS Prime | — | 2 full loads/hr.[3] |
| Throughput for Image Reversal | — | (2) 1/2 loads/hr.[3] |
| HMDS usage | — | < 5 ml/200 wafers (75 prime cycles/pint)[3] |
| Temperature | — | 160°C max[3] |
| Outer system | — | stainless steel[3] |
| Chamber dimensions | — | 20-in (508mm) High; 20-in (508mm) Wide; 15.12-in (384mm) Deep[1] |
| System dimensions | — | 26-in (660mm) High; 33.75-in (858mm) Wide; 25-in (635mm) Deep[1] |
| Weight | — | 350 pounds[1] |
| Power | — | 115V, 60Hz, 1 Phase, 30A or 220V, 50 Hz, 1 Phase, 15A[1] |
| Process applications | — | HMDS prime; image reversal; vapor prime[4] |
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