Waferpedia

Comparison ledger

FPA 5500 iZaversus1505 G 6 E

Canon FPA 5500 iZa, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCanonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run—1988–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 5500 iZaNikon 1505
Cited variants
  • FPA 5500 iZa i-Linei-line[1]
—
Specifications
ManufacturerCanon[2]—
ModelFPA 5500 iZa[2]1505 G 6 E[5]
CategoryLithography[3]Stepper[5]
Tool typeStepper / Scanner[2]—
Wafer size300mm[4]—
Wafer chuck typePin chuck[4]—
Projection lens magnification1:4[4]—
NAVariable (0.57~0.45 / 0.01 resolution)[4]0.54[6]
Exposure lighti Line (365nm)[4]—
Light sourceUltra high-pressure mercury lamp[4]—
Light source manufacturer/modelUshio Inc. / SUV-4500CIL[4]—
Reticle storage14ea (Standard), Nikon type 15ea (Total 29ea)[4]—
Reticle barcode reader2D[4]—
Configuration—5" reticle[5]
Resolution—650 nm[6]
Numerical Aperture—0.54[6]
Reduction—5x[6]
Exposure Field—15 x 15 mm[6]
Alignment Accuracy—130 nm[6]
Wafer Size—4 inch[5]
Light Source—g-line[7]
Introduction Year—1988[6]
NA (Numerical Aperture)—0.54[6]
Make—Nikon[5]
Wafer Sizes—4 inch[5]
Exposure type—g-line[6]
Exposure field—9.3 x 18.8 mm[6]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]f.machineryhost.comf.machineryhost.com
  5. [5]inventory listing
  6. [6]web.archive.orgweb.archive.org
  7. [7]ece.utoronto.caece.utoronto.ca