Comparison ledger
ASML Twinscan XT 1400 F, Nikon NSR S 204 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 204 BNikon | |
|---|---|---|
| OEM | ASML | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan XT 1400 | Nikon NSR S 204 |
| Cited variants | — | |
| Specifications | ||
| Configuration | 193nm (ArF)[1] | Cymer ELS 6400[2] |
| Make | ASML[1] | Nikon[6] |
| Model | Twinscan XT 1400 F[1] | NSR S 204 B[6] |
| Category | Lithography[4] | — |
| Wafer Sizes | 12 inch[1] | 8 inch[6] |
| Wavelength | 193 nm[1] | — |
| Process Module | 200 mm[4] | — |
| Conversion Kit | 300 mm[4] | — |
| Resolution | 65 nm[5] | — |
| Numerical Aperture | 0.65 to 0.93[5] | — |
| Throughput | 133 wph (@125 exp per wafer)[5] | — |
| Software Version | — | MCSV[6] |
| CIM | — | SECS[6] |
| Process | — | Photolithography[6] |
| Handler System | — | WL Type 3[6] |
| Factory Interface | — | Open Cassette[6] |
| WL Size | — | 200MM[3] |
| Reticle Size | — | 6"[3] |
| RL Type | — | Standard (no smif)[3] |
| NEMA Box | — | 3P 200V[3] |
| Chamber | — | Sendai[3] |
| Lens Type | — | 4EN2GK[3] |
| Chemical Filter | — | Donaldson[3] |
| Online Interface | — | Tel ACT 8 Slow[3] |
| Wafer Size | — | 8 inch[6] |
| Laser | — | Cymer ELS 6400[2] |
| Vintage | — | 2001[2] |
| Variable NA | — | Yes[3] |
| HDD | — | Included[7] |
| Lens Data | — | Available[7] |
| Features | — | Chip (table) Leveling; In-Line Right; Tel Track; FIA; Pellicle Particle Detector; Variable NA; Microscope Theta; Signal Tower I/F; Online Interface: Tel ACT 8 Slow; MCSV; OCSV; GOCS; Bar Code Reader; MES Software; AIS; Signal Lamp Tower; RPF (random pattern filter)[3] |
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