Comparison ledger
ASML Twinscan XT 1400 F, Nikon NSR S 203 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 203 BNikon | |
|---|---|---|
| OEM | ASML | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan XT 1400 | Nikon NSR S 203 |
| Specifications | ||
| Configuration | 193nm (ArF)[1] | 248 nm[5] |
| Make | ASML[1] | — |
| Model | Twinscan XT 1400 F[1] | NSR S 203 B[4] |
| Category | Lithography[2] | — |
| Wafer Sizes | 12 inch[1] | — |
| Wavelength | 193 nm[1] | 248 nm[5] |
| Process Module | 200 mm[2] | — |
| Conversion Kit | 300 mm[2] | — |
| Resolution | 65 nm[3] | — |
| Numerical Aperture | 0.65 to 0.93[3] | — |
| Throughput | 133 wph (@125 exp per wafer)[3] | — |
| Software Version | — | MCSV[4] |
| CIM | — | SECS[4] |
| Handler System | — | WL Type 3[4] |
| Factory Interface | — | Open Cassette[4] |
| Excluded | — | Hard Drives (2)[4] |
| Process | — | Scanner[5] |
| Handler | — | WL Type 3[7] |
| IU Flare | — | 0.84%[7] |
| Lens Flare | — | 8.50%[7] |
| Uniformity | — | 6.00%[7] |
| Power | — | 541 mW/cm2[7] |
| Total Focus Deviation | — | 0.202 µm[7] |
| Astigmatism | — | 0.119 µm[7] |
| Coma | — | 0.040 µm[7] |
| ISO DOF | — | 0.275 µm[7] |
| Wafer size | — | 200 mm (8 inch)[4] |
| Process type | — | Scanner[5] |
| CIM interface | — | SECS[4] |
| Iso DOF | — | 0.241 µm[8] |
| Light source | — | Cymer ELS 5410[6] |
| Manufacturer | — | Nikon[4] |
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