Comparison ledger
ASML 5500/80, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 5500/80ASML | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | 4-inch wafers; convertible to 3-inch or 6-inch platforms | — |
| Process node | 500nm resolution | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | i-Line | — |
| Family | ASML 5500/80 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Resolution | 500nm[1] | — |
| Alignment accuracy | <70nm[1] | — |
| Wafer setup | Set up for 4-inch wafers[1] | — |
| Convertible platforms | 3-inch or 6-inch platforms[1] | — |
| Field size | 21mm x 21mm[1] | — |
| Depth of focus | 1.3µm[1] | — |
| Category | Lithography[2] | — |
| Wafer size | 4-inch wafers; convertible to 3-inch or 6-inch platforms[1] | — |
| Generation | i-line[3] | — |
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