Comparison ledger
Applied Materials Centura MXP, Applied Materials Centura MXP Dry, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura MXPApplied Materials | Centura MXP DryApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura MXP | Applied Materials Centura MXP |
| Specifications | ||
| Configuration | 3 CH[1] | Polymer[4] |
| Phase | 3 Phase[1] | — |
| Frequency | 50 Hz[1] | — |
| Voltage | 208 VAC[1] | — |
| Wires | Four[2] | — |
| Full Load Current | 240 A[2] | — |
| H/E 1 | 0242-02163 REV D[3] | — |
| UPS | DPWR 35611[3] | — |
| H/E (CH-B_C_D_Wall) | 0242-02163 REV D[3] | — |
| Chambers | 3 CH[1] | — |
| Robot | HP Robot[1] | — |
| Power Supply Voltage | 208 VAC[1] | — |
| Power Supply Frequency | 50 Hz[1] | — |
| Number of Wires | Four / 4 Wires[1] | — |
| 2ch | — | D/E CH-A/B[4] |
| Tool type | — | Dry etcher[5] |
| Manufacturer | — | Applied Materials[5] |
| Wafer size | — | 8 inch[4] |
| Chamber configuration | — | 2ch D/E CH-A/B[4] |
| Process configuration | — | Polymer[4] |
| Vintage | — | 1996[4] |
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