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Comparison ledger

0041-39086 ESC PartversusTE 8500 PESC Dry

Applied Materials 0041-39086 ESC Part, Tokyo Electron TE 8500 PESC Dry, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
TE 8500 PESC DryTokyo Electron
OEMApplied MaterialsTokyo Electron
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Tokyo Electron TE 8500
Specifications
Configuration—1 chamber[1]
Gas—CF4, CHF3, He[1]
Process type—Dry etcher[2]
Number of chambers—1 chamber[1]
Process application—Oxide etch with end point[1]
Process gases—CF4, CHF3, He[1]
Operating system (OS)—EPROM based system[1]
Loaders (LD)—2ea, Fortrend[1]
Pumps—2ea, Ebara, A30W[1]
Listed unit vintage—1996[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com