Comparison ledger
Applied Materials 0010 47763, Oxford Instruments Plasmalab 100 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Plasmalab 100 RIEOxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Oxford Instruments Plasmalab 100 |
| Cited variants | — | |
| Specifications | ||
| Configuration | 2nd Source New[3] | With VAT PM-5 Adaptive Pressure Controller[6] |
| Type | Monopolar Dual Heated[4] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[5] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[4] | — |
| Model | 0010-47763[3] | — |
| OEM | Applied Materials[3] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[4] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[4] | — |
| Quantity available (source) | 1[4] | — |
| Voltage | — | 208V, 50/60Hz[6] |
| Wafer Size | — | 6 inch[6] |
| RF Generator | — | Advanced Energy RFX 600A, 600 W @ 13.56 MHz[2] |
| Electrode Temperature Range | — | 10°C to 80°C[2] |
| Turbo Pump | — | Alcatel ATH 400M[2] |
| Turbo Pump Controller | — | Alcatel ACT 600M[2] |
| Pressure Controller | — | VAT PM-5 Adaptive Pressure Controller[6] |
| Number of Gas Lines | — | 6 (with MFCs)[2] |
| Installed Gases | — | Ar, N2, CHF3, NF3, N2O[2] |
| Chiller | — | Thermo Neslab RTE7 Chiller and OptiTemp OTI-5WL-P3-216 Chiller[6] |
| Vacuum Pump | — | Leybold D65BCS Vacuum Pump with oil filter and exhaust filter[6] |
| Control System | — | Windows PC with user-friendly interface and blue PLC control architecture[2] |
| Platen Size | — | 330 mm platen[2] |
| Load-locked | — | Yes[1] |
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