Waferpedia

Comparison ledger

0010-16392 ESC Assemblyversus901

Applied Materials 0010-16392 ESC Assembly, Tegal 901, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
901Tegal
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyTegal 901
Specifications
OEMApplied Materials[1]—
Model0010-16392[1]—
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Configuration—Poly[3]
Wafer size—3 inch, 100 mm to 150 mm[5]
Primary process—non-critical silicon nitride and photoresist trim[5]
Reactor type—wide gap RF diode reactor[5]
Temperature regime—low temperature plasma etch[5]
Wafer handling—no wafer clamps or electrostatic chucks[5]
Additional process—poly etching[3]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]web.archive.orgweb.archive.org