Comparison ledger
Applied Materials 0010-13622 RF Match for, Applied Materials Precision 5000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Precision 5000Applied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | 1987 |
| Production run | — | 1987– |
| Lifecycle | — | Legacy |
| Lifecycle milestones | — | 1987 Introduction · 1993 Smithsonian collection · 1993 Smithsonian permanent collection induction · 1993 Inducted into Smithsonian collection |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Applied Materials Precision 5000 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Process | — | Chemical vapor deposition (CVD)[2] |
| Architecture | — | Single machine with multiple process chambers; incorporated diverse processes[2] |
| Introduction Year | — | 1987[2] |
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