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Comparison ledger

0010-03485 Magnet AssyversusRS 35 Sheet Resistance Measurement

Applied Materials 0010-03485 Magnet Assy, KLA RS 35 Sheet Resistance Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsKLA
Category——
Wafer size—One wafer manual loader
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyKLA RS 35
Cited variants—
  • RS 35 C Sheet Resistance Measurement[1]
Specifications
ConfigurationWP AL 300mm PVD[2]Scan stage[6]
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]One wafer manual loader[6]
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Process vac—23 InHg[6]
CDA—100 PSI[6]
Inlet Power—1 line of 115 vac, 8 amp[6]
Wafer Size—6 inch[6]
Wafer Handling—One wafer manual loader[6]
Scan Stage—Yes[6]
Process Vacuum—23 InHg[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]inventory listing