Comparison ledger
Agilent 5890 Gas Chromatography, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 5890 Gas ChromatographyAgilent | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 58xx | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Configuration | 50/60Hz[1] | WP AL 300mm PVD[2] |
| 100v | Type F 3.0 A[1] | — |
| Voltage | 120V Type F 2.5 A[1] | — |
| Frequency | 50/60 Hz[1] | — |
| 100V Input Current | 3.0 A[1] | — |
| 120V Input Current | 2.5 A[1] | — |
| 220V-240V Input Current | 2.0 A[1] | — |
| 250V Rating | Yes[1] | — |
| OEM | — | Applied Materials[2] |
| Model | — | 0010-03485[2] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[3] |
| Process | — | PVD[4] |
| Wafer size | — | 300mm[5] |
| Version | — | Spares[5] |
| Part Number | — | 0010-03485[2] |
| Manufacturer | — | Applied Materials[2] |
| Process Type | — | PVD (Physical Vapor Deposition)[2] |
| Application (Material) | — | Aluminum (AL)[2] |
| Wafer Diameter (associated) | — | 300 mm[2] |