Waferpedia

Comparison ledger

12-2P-CPversusPB12

YES 12-2P-CP, YES PB12, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
PB12YES
OEMYESYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyYES 12-2P-CPYES PB12
Cited variants
  • YES-PB8 High Vac Specs[2]
  • YES-PB12 High Vac Specs[2]
Specifications
Model designation12-2P-CP[1]PB12 High Vac Specs[2]
SeriesYES-PB Series / 450PB Series[1]PB-HV Series (manual load)[2]
Wafer size300 mm wafers[1]up to 300mm wafers[2]
Load typemanual load[3]—
Application scopeMEMS and semiconductor process applications[4]—
Cooling packageAir-only cooling package; no water[1]—
AirflowVertical laminar airflow[1]—
High vacuum10-6[1]—
Maximum temperatureup to 450°C[1]up to 450°C[2]
Interfacetouch screen interface[4]—
Tool typemanual-load high-temperature cure oven[3]—
Process applicationsMEMS and semiconductor process applications[3]—
Vacuum—high vacuum (10^-5)[2]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org
  4. [4]web.archive.orgweb.archive.org