Waferpedia

Comparison ledger

12-2P-CPversus450 PB 12 Polyimide

YES 12-2P-CP, YES 450 PB 12 Polyimide, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMYESYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyYES 12-2P-CPYES 450
Cited variants—
Specifications
Model designation12-2P-CP[1]—
SeriesYES-PB Series / 450PB Series[1]—
Wafer size300 mm wafers[1]Capacity is two 25 wafer cassettes in a batch process (50 wafers at a time) - 300mm FOUP[4]
Load typemanual load[2]—
Application scopeMEMS and semiconductor process applications[3]—
Cooling packageAir-only cooling package; no water[1]—
AirflowVertical laminar airflow[1]—
High vacuum10-6[1]—
Maximum temperatureup to 450°C[1]—
Interfacetouch screen interface[3]—
Tool typemanual-load high-temperature cure oven[2]—
Process applicationsMEMS and semiconductor process applications[2]—
Chamber Material—316L Stainless Steel[4]
Operation Temperature—ambient to 450°C (option high temp version: Ambient to 550°()[4]
Process Gas Inputs—1 standard up to 3 optional[4]
Configuration—Preheated N, (Process Gas)[4]
Mass Flow Controllers—optional, up to 3[4]
Laminar Flow Filter—100 micron Mott'" plate filter[4]
Cleanliness—particle reduction in most applications[4]
OEM—YES[4]
Model—450 PB 12[4]
Category—Thermal / Diffusion[5]
Capacity—Two 25-wafer cassettes in a batch process (50 wafers at a time)[4]
FOUP compatibility—300mm FOUP[4]
Wafer handling—Uses wafer cassette; wafers are manually brought to the machine and loaded inside[4]
Operation temperature—Ambient to 450°C[4]
Gas delivery—1 standard up to 3 optional[5]
Process gas—Preheated N2[4]
Vacuum—Alternate vacuum valve for process vacuum[5]
Vacuum plumbing—VCR[5]
Number of Recipes—8 temperature profiles (up to 200 with YES - DAQ-LR option)[4]
Temperature—Ambient to 450°C with LED temperature and set point displays[4]
Voltage—208V, 3 Phase 50/60 Hz, 40 amps[4]
Oxygen Concentration—10 ppm over background[4]

Plan your fab

Building a Thermal / Diffusion process? Get a complete equipment list.

Open the fab equipment planner →
Sources (5)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com