Comparison ledger
Varian 160 XP, Varian Viision 200 + High Current, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 160 XPVarian | |
|---|---|---|
| OEM | Varian | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Varian 160 XP | Varian Viision 200 + High Current |
| Cited variants |
| — |
| Specifications | ||
| Configuration (160 XP Ion variant) | 150mm High Current IMP[1] | — |
| Wafer size | — | 200 mm[2] |
| Power requirements | — | 208 V, 140 A, 50/60 Hz, 3 Phase[3] |
| Cassette to cassette | — | Yes[3] |
| Bernas ion source | — | Yes[2] |
| Two-dimensional beam profiler | — | Yes[2] |
| CE-marked | — | Yes[2] |
| Computer system | — | 147 MHz Main & ES CPU[2] |
| Cryo pumps | — | 4× CTI 250F, 2× CTI 9600 compressors[2] |
| Frequency kit | — | 50 Hz[2] |
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