Waferpedia

Comparison ledger

0332 F 9453 302 DiffusionversusLSA101

Varian 0332 F 9453 302 Diffusion, Veeco LSA101, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
LSA101Veeco
OEMVarianVeeco
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced—2021
Production run——
Lifecycle——
Lifecycle milestones—2021 First shipment
Control system——
Generation——
FamilyVarian 0332 F 9453 302 DiffusionVeeco LSA101
Specifications
Asset Number142841[1]—
Last Confirm DateOctober 14, 2025[2]—
System type—Laser Spike Annealing System[3]
Process application—Precision doping of materials at a controlled temperature[3]
Origination facility—San Jose, California[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]fab-spares.comfab-spares.com
  3. [3]en.wikipedia.orgen.wikipedia.org