Comparison ledger
Tokyo Electron Expedius, Tokyo Electron Expedius Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ExpediusTokyo Electron | Expedius PlusTokyo Electron |
|---|---|---|
| OEM | Tokyo Electron | Tokyo Electron |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2007 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Expedius | Tokyo Electron Expedius |
| Specifications | ||
| Configuration | single block[1] | Resistivity monitoring (Horiba)[3] |
| Wafer size capability | 5 to 8 inches[2] | — |
| Platform | CLEAN TRACK MARK 7[2] | — |
| Cleaning capability | Both sides of wafer[2] | — |
| Transfer system | Vacuumless robotic transport[2] | — |
| Chuck type | Mechanical and vacuum chucks[2] | — |
| Brush pressure control | Automatic brush pressure controller[2] | — |
| Optional cleaning modules | High-pressure jet spray or megasonic clean[2] | — |
| Host communication | GEM host communication[2] | — |
| Interface | SMIF interface[2] | — |
| Compliance | S2-93 and CE mark[2] | — |
| OEM | Tokyo Electron[1] | Tokyo Electron[3] |
| Model | Expedius[1] | Expedius Plus[3] |
| Equipment type | Wet Bench[1] | Wet Bench[3] |
| Wafer capability | 5 inch to 8 inch[2] | — |
| Wafer transfer | non-vacuum wafer transfer capability[2] | — |
| Application | — | Pre-Diffusion Clean[3] |
| Bath-1 | — | SPM[3] |
| Operating | — | 110 - 150°C, H2SO4/H2O2 (3:1), circulation[3] |
| Chemical spiking | — | auto concentration feedback[3] |
| Bath Material | — | Quartz[3] |
| Bath-2 | — | QDR (hot)[3] |
| Megasonic | — | 950 kHz, 2400W (600*4)[3] |
| Bath-3 | — | APM[3] |
| Bath-4 | — | POU[3] |
| Bath-5 | — | HPM[3] |
| Bath-6 | — | QDR (hot)[3] |
| Dryer | — | SD2[3] |
| Vintage | — | 2007[3] |
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