Comparison ledger
Thermo Fisher 1300 Series Safety, Tokyo Electron Clean Track ACT 8 Multi Block, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1300 Series SafetyThermo Fisher | Clean Track ACT 8 Multi BlockTokyo Electron |
|---|---|---|
| OEM | Thermo Fisher | Tokyo Electron |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2026 Third-party support only | 1997 Date of manufacture · 2017 Date of manufacture |
| Control system | — | — |
| Generation | — | — |
| Family | Thermo Fisher 1300 | Tokyo Electron Clean Track ACT 8 Multi Block |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Class II[2] | — |
| Cabinet type | Class II, Type A2 biological safety cabinet[3] | — |
| Airflow compensation | SmartFlow airflow compensation system[3] | — |
| Motors | Dual DC motors[3] | — |
| Front window design | SmartClean front window design[3] | — |
| Control panel | Intuitive control panel with constant readout of downflow and inflow velocities and filter reserve status[3] | — |
| UV light | Programmable UV light[3] | — |
| SmartPort | SmartPort convenience for routing tubing and cables through the side walls[3] | — |
| Available widths | 3-foot, 4-foot, 5-foot, and 6-foot sizes[3] | — |
| Front opening choices | 8-inch or 10-inch front opening[3] | — |
| Filter specification | H14 HEPA filters, EN 1822, 99.995% @ MPPS[4] | — |
| Certification | NSF/ANSI 49, UL, CE[4] | — |
| Service valves | Up to 6 total, 3 on each side wall[4] | — |
| Date of Manufacture | — | 1997-12-31[5] |
| Currently Configured for | — | 200mm[5] |
| OEM | — | Tokyo Electron[1] |
| Model | — | Clean Track ACT 8 Multi Block[5] |
| Type | — | Multi Block (Resist Coater/Developer)[1] |
| Equipment class | — | Resist Processing Equipment[5] |
| Wafer configuration | — | 200mm[5] |
| Date of manufacture | — | 2017-01-01[1] |
| Purpose | — | Photoresist spin-coater and developer[6] |
| Wafer Size | — | 200mm[7] |
| Resist Types | — | Negative tone and positive tone[6] |
| Supported Resists | — | KMPR-1005 (1002), OIR-647-17(11)[6] |
| Pre-wet Solvents | — | Cyclopentanone or HMDS[6] |
| Bake Capabilities | — | Soft-bake and post-exposure bake[6] |
| Interface | — | Direct interface with ASML stepper[6] |
| Equipment Type | — | Resist Processing Equipment / Multi Block (Resist Coater/Developer)[5] |
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