Comparison ledger
SUSS MicroTec MA 200 Automatic Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 200 Automatic MaskSUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | Capable of working with wafer masks up to 9″ x 9″ | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA 200 | Ultratech 1000 Family |
| Specifications | ||
| Wafer size | Capable of working with wafer masks up to 9″ x 9″[1] | — |
| Configuration | Configured for top side alignment[1] | — |
| OEM | SUSS MicroTec[2] | — |
| Category | Lithography[2] | — |
| Alignment configuration | Configured for top side alignment[1] | — |
| Lamp house | 1000 watt lamp house[1] | — |
| Lamp power supply unit | CIC 1000 LH 1000[1] | — |
| Optic | UV 400 Optic (for 365nm & 405nm)[1] | — |
| Lamp adapter | Lamp adapter LH1000/HBO MA8/MA200[1] | — |
| Light sensor | Suss 2 Channel light sensor 365/405nm[1] | — |
| Auto alignment system | AL 3000 Auto alignment system[1] | — |
| Microscope | DVM8 microscope with motorized objective movement with field expanders[1] | — |
| Objective | Objective 20x Olympus UMPL FL 20 X – working distance 12mm[1] | — |
| Pre-aligner | XRS pre aligner[1] | — |
| Mask holder | Large clear field proximity mask holder for 9″ corner marks, with 8″ exposure area[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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