Comparison ledger
SUSS MicroTec 150 e Mask, SUSS MicroTec MA 150 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | MA 150 ESUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | SUSS MicroTec MA 150 |
| Specifications | ||
| Configuration | — | Refurbished[1] |
| Wafer size | — | 150mm (6 inch)[2] |
| Exposure optics | — | UV400 (365nm/405nm)[3] |
| Lamphouse power | — | 1000 Watt[4] |
| Alignment accuracy | — | < 1.0 µm[3] |
| Operating system | — | Windows 2000[4] |
| Power supply | — | CIC1200[3] |
| Microscope | — | DVM6 Microscope[4] |
| Prealigner type | — | XRS[3] |
| Exposure modes | — | Hard, Soft, Proximity, Vacuum Contact[4] |
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