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Comparison ledger

Shuttleline ICPversus1512e

Plasma-Therm Shuttleline ICP, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Shuttleline ICPPlasma-Therm
1512eTegal
OEMPlasma-ThermTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyPlasma-Therm Shuttleline ICPTegal 1512e
Specifications
ConfigurationEtched III-V materials[1]—
Wafer Size6 inch[1]—
Etched MaterialsIII-V materials[1]—
External pumps and chillerNot included[1]—
Tool typeInductively coupled plasma etcher[1]Industrial RIE plasma etcher system[3]
Process materialIII-V materials[1]—
Vacuum & pumpingExternal pumps and chiller not included[2]—
Stated configuration—With modules assembly for CI-4222[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]semistarcorp.comsemistarcorp.com