Comparison ledger
Oxford Instruments Plasmalab-80plus-Cloey-S, Tegal 6550, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Plasmalab-80plus-Cloey-SOxford Instruments | 6550Tegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | 100mm | 100mm |
| Process node | — | — |
| Introduced | — | 2000 |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2000 Patent announcement · 2001 Order announced |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab-80plus-Cloey-S | Tegal 6550 |
| Cited variants | — |
|
| Specifications | ||
| Process gases | BCl3, Cl2, N2, CF4, O2, Ar[2] | — |
| Use | Etching of compound semiconductors and metals[2] | — |
| Allowed masks | Photoresist and dielectrics[2] | — |
| Platen size | 238 mm[2] | — |
| Power range | < 270 Watts[2] | — |
| MFC flow range - BCl3 | 0 – 100 sccm[2] | — |
| MFC flow range - Cl2 | 0 – 50 sccm[2] | — |
| MFC flow range - CF4 | 0 – 100 sccm[2] | — |
| MFC flow range - O2 | 0 – 50 sccm[2] | — |
| MFC flow range - Ar | 0 – 100 sccm[2] | — |
| MFC flow range - N2 | 0 – 100 sccm[2] | — |
| Pressure range | < 250 mTorr[2] | — |
| Product type | — | etch reactor / plasma etch system[3] |
| Wafer size | — | 100mm–200mm[1] |
| Process target | — | non-volatile metal and metal oxide films[3] |
| Primary application | — | volume production of magnetic memory components such as MRAM and GMR devices[3] |
| Platform | — | full cluster tool technology[3] |
| Process capability | — | patented rinse-strip-rinse feature / process capability[3] |
| Chamber configuration | — | dual-chamber platform[4] |
| Plasma source | — | patented next-generation dual-frequency plasma source technology[3] |
| Plasma source (later material) | — | Spectra plasma source[4] |
| Available option | — | deposition shield[3] |
| Type | — | plasma etch reactor[3] |
| Processes | — | etching non-volatile metal and metal oxide films[3] |
| Plasma source technology | — | patented next-generation, dual-frequency plasma source technology[3] |
| Variant | — | Spectra plasma source[4] |
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