Comparison ledger
Oxford Instruments 80-etch, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 80-etchOxford Instruments | 1512eTegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 80-etch | Tegal 1512e |
| Specifications | ||
| OEM | Oxford Instruments[1] | — |
| Model | 80-etch[1] | — |
| S/N | 9M69591A[1] | — |
| Controller arrangement | One controller for both RIE and PECVD[1] | — |
| PECVD capabilities | Amorphous Si, Si3N4, SiONx, SiO2[1] | — |
| Source gases available | SiH4, N2, N2O, NH3, Ar[1] | — |
| Category | Etch[2] | — |
| Process use | Wafer or thin film etching/patterning[1] | — |
| Serial number | 9M69591A[1] | — |
| Source gases | SiH4, N2, N2O, NH3, Ar[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[3] |
| Stated configuration | — | With modules assembly for CI-4222[3] |
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