Waferpedia

Comparison ledger

HR 8500 III TW UV Detaperversus1000FP

Nitto HR 8500 III TW UV Detaper, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMNittoYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNitto HR 8500 III TW UV DetaperYES 1000FP
Specifications
Control MethodOne Board Micro Computer[1]—
Wafer Transfer Robot3-axis type[1]—
ConfigurationInstallation Environment:[1]—
Temperature25 ± 5 degrees C[1]—
Humidity45 ± 15%[1]—
OthersClean level ; Class 1,000 or more (Place where it will be subjected to direct sunlight)[1]—
Power1.5 kVA[1]—
For AirRc 3/8 screw[1]—
Lug with grounding linw (Cable LengthApprox. 5m)[1]—
OEMNitto Denko[1]—
ModelHR 8500 III TW UV[1]Glen/YES 1000FP[2]
Wafer Sizes8 inch[1]—
Clean levelClass 1,000 or more[1]—
Power SupplySingle Phase; AC 100 V ± 5%; 1.5 kVA; 50/60 Hz[1]—
Air SupplyDry Air; 0.5 MPa or more; 250 NL/min or more[1]—
Connection PortFor electrical power; For Air: Rc 3/8 screw; Lug with grounding linw (Cable Length: Approx. 5m)[1]—
System type—Plasma cleaning system[2]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[2]
Designed use—Designed to accept a range of shelf sizes[2]
Application focus—Changing needs of the flat panel industry[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org