Comparison ledger
Nikon NSR 2205 i 8 A i-Line, OAI 806, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 806OAI | |
|---|---|---|
| OEM | Nikon | OAI |
| Category | Lithography | Lithography |
| Wafer size | 6" | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 2205 | OAI 806 |
| Specifications | ||
| Resolution | 0.5µm[1] | — |
| Computer Type | PDP11[1] | — |
| Rentical Size | 5 Inch[1] | — |
| Field Sizes | 15 / 17.5 / 20mm[1] | — |
| Wafer Size | 6 Inch Flat[1] | — |
| Reticle Libraries | 1[1] | — |
| Wafer Loader | Type 1[1] | — |
| Wafer size | Wafer Loader Pre-alignment 2[1] | — |
| Configuration | Barcode Reader[1] | — |
| Wafer Loader Indexers | 2[1] | — |
| Autofocus | Single Point[1] | — |
| Chuck Type | Ceramic Ring Chuck[1] | — |
| Water Stage | Ballscrew[1] | — |
| MCS2 Version | 2.4B[1] | — |
| Model | — | OAI 806 Mask Aligner[2] |
| Patterning substrate size | — | up to 6 inches[2] |
| Contact modes | — | soft, hard, and proximity contact modes[2] |
| Alignment accuracy | — | submicron[2] |
| UV source | — | collimated UV light source[2] |
| Workholding | — | vacuum chuck[2] |
| Optics | — | integrated microscope optics[2] |
| Stage | — | motorized stage[2] |
| Optional capability | — | backside alignment[2] |
| Substrate size | — | up to 6 inches[2] |
| Light source | — | collimated UV[2] |
| Backside alignment | — | optional[2] |
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