Comparison ledger
Nikon 1505 G 6 E, SUSS MicroTec MA 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | MA 200SUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | SUSS MicroTec MA 200 |
| Specifications | ||
| Configuration | 5" reticle[1] | 3200 VA[4] |
| Resolution | 650 nm[2] | — |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | MA 200[4] |
| Category | Stepper[1] | Aligner[5] |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Voltage | — | 230 V[4] |
| Frequency | — | 50 Hz[4] |
| Manufacturer | — | SUSS[4] |
| Wafer sizes | — | 6 inch[4] |
| Referenced in process guidance | — | AZ P4000 Series exposure-dose guidance lists Suss MA-200 and gives approximate dose values of 1.5 μm = 90 mJ/cm2, 3.5 μm = 135 mJ/cm2, and 12 μm = 800 mJ/cm2[6] |
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