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Comparison ledger

1505 G 6 EversusNSR S 207 D

Nikon 1505 G 6 E, Nikon NSR S 207 D, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMNikonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run1988–—
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNikon 1505Nikon NSR
Cited variants—
  • NSR S 207 D with Cymer laser[1]
  • NSR S 207 D with Gigaphoton laser[2]
  • NSR S 207 D with G41K2 Gigaphoton laser[3]
  • NSR S 207 D machine only[4]
  • Nikon NSR S 207 D with Cymer laser[1]
  • Nikon NSR S 207 D with Gigaphoton laser[2]
  • Nikon NSR S 207 D with Gigaphoton laser (second unit)[5]
  • Nikon NSR S 207 D with G41K2 Gigaphoton laser[3]
Specifications
Configuration5" reticle[6]With Cymer laser[1]
Resolution650 nm[7]—
Numerical Aperture0.54[7]—
Reduction5x[7]—
Exposure Field15 x 15 mm[7]—
Alignment Accuracy130 nm[7]—
Wafer Size4 inch[6]—
Light Sourceg-line[8]—
Introduction Year1988[7]—
NA (Numerical Aperture)0.54[7]—
MakeNikon[6]—
Model1505 G 6 E[6]NSR S 207 D[1]
CategoryStepper[6]—
Wafer Sizes4 inch[6]—
Exposure typeg-line[7]—
NA0.54[7]—
Exposure field9.3 x 18.8 mm[7]—
Laser source (variant)—Cymer laser[1]
OEM—Nikon[1]
Equipment type—Stepper[1]
Laser—Cymer laser[1]
Vintage—2005[1]
Last Confirm Date—July 20, 2023[4]

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Sources (8)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing
  6. [6]inventory listing
  7. [7]web.archive.orgweb.archive.org
  8. [8]ece.utoronto.caece.utoronto.ca