Comparison ledger
Laurell H6-15, Laurell H6-23, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | H6-15Laurell | H6-23Laurell |
|---|---|---|
| OEM | Laurell | Laurell |
| Category | Spin coater | Spin coater |
| Wafer size | 300mm | 150mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | 650-series HL |
| Family | Laurell H6-15 | Laurell H6-23 |
| Specifications | ||
| Model | H6-15[1] | — |
| Series | 650-series HL coater system[1] | 650-series HL coater system[2] |
| Maximum wafer size | Up to ø 300mm wafers[1] | — |
| Maximum substrate size | 9" × 9" (229mm × 229mm) substrates[1] | — |
| Maximum rotational speed | 12,000 RPM[1] | 12,000 RPM (based on a ø 100mm silicon wafer)[2] |
| Controller/software | Wireless tablet featuring Laurell Touch process control software; accompanying PC software Spin 3000 is also mentioned[1] | — |
| Power | 95 to 240VAC, 47/63HZ, ~300 Watts[1] | 95 to 240VAC, 47/63HZ, ~300 Watts[2] |
| Required nitrogen/CDA purge | 60–70 PSIG (4–5 bar)[1] | — |
| Vacuum | 25–28 inches Hg suggested; 4.5 SCFM at 0 inches Hg[1] | — |
| Wafer size | up to ø 300mm wafers[1] | Up to 150 mm wafers[2] |
| Substrate size | 9" × 9" (229mm × 229mm) substrates[1] | 5 in x 5 in (127 mm x 127 mm) substrates[2] |
| Speed basis | based on a ø 100mm silicon wafer[1] | Based on a 100 mm silicon wafer[2] |
| Control software | Laurell Touch process control software with accompanying Spin 3000 PC software[1] | — |
| Controller | wireless tablet[1] | — |
| Gas purge | 60–70 PSIG Nitrogen/CDA[1] | — |
| Wafer capacity | — | Up to ø 150mm wafers[2] |
| Substrate capacity | — | 5" × 5" (127mm × 127mm) substrates[2] |
| Category | — | Spin coater[2] |
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