Comparison ledger
Lam Research Rainbow 4520 Plasma RIE, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4520 Plasma RIELam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4520 | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | ESC with perimeter pins[1] | — |
| Without | pumps, chillers[1] | — |
| Manufacturer | Lam[2] | — |
| Model | Rainbow 4520[2] | — |
| Tool Type | Plasma RIE (Reactive Ion Etcher)[2] | — |
| Wafer Size | 8 inch[1] | — |
| Chuck Configuration | ESC with perimeter pins[1] | — |
| Load Locks | 2 (entrance and exit)[1] | — |
| Included Equipment | Without pumps, chillers[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[4] |
| Cryo DRIE etch rate | — | up to 5 µm/min[4] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[4] |
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