Comparison ledger
KLA .498 PSL Wafer, Zeiss Gemini560, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Gemini560Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | Zeiss Gemini560 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| NIST traceability | Yes[1] | — |
| equipment type | — | SEM[2] |
| Electron source | — | Field emission[3] |
| Resolution at 15 kV | — | 0.5 nm[4] |
| Resolution at 1 kV | — | 0.8 nm[4] |
| Detector types | — | Secondary electron (SE), backscatter electron (BSE), IR-CCD camera[4] |
| EDS system | — | Oxford Ultim Extreme[4] |
| EDS detection range | — | Li to Cf[4] |
| EDS energy resolution | — | ≤100 eV (at Mn Kα)[4] |
| EDS spatial resolution | — | 10 nm[4] |
| Cryo preparation system | — | PP3000T[4] |
| Optional detectors | — | EDAX EDS and EBSD[3] |
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