Comparison ledger
KLA .498 PSL Wafer, Onto Innovation MetaPulse 200 C Film Thickness Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MetaPulse 200 C Film Thickness MeasurementOnto Innovation | |
|---|---|---|
| OEM | KLA | Onto Innovation |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | Onto Innovation MetaPulse 200 |
| Specifications | ||
| Configuration | NIST Traceable[1] | 4900 va[2] |
| NIST traceability | Yes[1] | — |
| Voltage | — | 220 VAC[2] |
| Maximum Single Load | — | 5 amps at 220 VAC[3] |
| Wafer size | — | 8 inch[2] |
| Power | — | 220 VAC[3] |
| Frequency | — | 50/60 Hz[3] |
| Apparent power | — | 4900 va[3] |
| Full load current | — | 16 Fla[3] |
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