Waferpedia

Comparison ledger

1.112 PSL WaferversusUltima III

KLA 1.112 PSL Wafer, Rigaku Ultima III, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLARigaku
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA 1.112 PSL WaferRigaku Ultima III
Specifications
ConfigurationNIST Traceable[1]1D D/teX Ultra high-speed silicon strip detector[3]
Wafer Size8 inch[1]—
NIST TraceableTrue[1]—
Compatible ToolsSurfscan 6xy0 and Sp1[2]—
1.2kW Cu Ka X-ray generator—λ = 1.5405 Å[3]
X-ray generator ranges—20 kV to 30 kV; 2 mA to 40 mA[3]
Detectors—Scintillation point detector and  a high-speed position sensitive detector system Dtex Ultra[3]
Optics—Bragg Brentano parafocusing optics and parallel beam optics with a parabolic X-ray mirror[3]
Auto Sample Exchanger—ACS-10[3]
Stage—Five axes high precision goniometer, fixed standard stage, and thin-film stage[3]
Monochromator—Ge (220) 2-bounce incident beam monochromator and graphite diffraction beam monochromator[3]
Instrument type—X-ray diffractometer / powder diffractometer[3]
Operating mode—theta/2theta mode[4]
Sample mounting design—2θ/θ design for horizontal sample mounting[5]
X-ray generator—1.2 kW Cu Ka X-ray generator; wavelength λ = 1.5405 Å[3]
X-ray generator range—20 kV to 30 kV; 2 mA to 40 mA[3]
Detector—Scintillation point detector and high-speed position sensitive detector system Dtex Ultra[3]
Sample stages—Standard powder stage, thin-film stage, small angle X-ray scattering stage (SAXS), and Differential Scanning Calorimetry-X-ray Diffraction Stage (DSC-XRD) stage[4]
Sample changer—Automatic sample exchanger (ASC-10)[3]
Software—Database and analysis software available on the operation PC and workstation PC[3]
Sample types—Bulk powders, thin-films, and liquids[4]
Stage(s)—Standard powder stage, thin-film stage, small angle X-ray scattering stage (SAXS), and Differential Scanning Calorimetry-X-ray Diffraction stage (DSC-XRD)[4]
Automated sample handling—Automatic sample exchanger (ASC-10)[3]
Monochromators—Ge (220) 2-bounce incident beam monochromator and graphite diffraction beam monochromator[3]
Stage / goniometer—Five axes high precision goniometer, fixed standard stage, and thin-film stage[3]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]cint.lanl.govcint.lanl.gov
  5. [5]nist.govnist.gov
  6. [6]ncnr.nist.govncnr.nist.gov
  7. [7]weizmann.ac.ilweizmann.ac.il