Comparison ledger
Hitachi S 4100 FE-SEM, KLA .498 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 4100 FE-SEMHitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi S 4100 FE-SEM | KLA .498 PSL Wafer |
| Specifications | ||
| Configuration | Manually operated 5 axis specimen chamber[1] | NIST Traceable[2] |
| Secondary electron image resolution | 2.0nm at 30 KV[1] | — |
| Magnification | 20X - 300KX[1] | — |
| Electron gun | cold field emission source[1] | — |
| Lens type | electromagnetic[1] | — |
| Objective aperture | 4 position externally selectable[1] | — |
| Stigmator | octopole electromagnetic[1] | — |
| Scanning coil | 2-stage electromagnetic[1] | — |
| Airlock | prepumped[1] | — |
| Stage motion | 5 axis manual, X/Y: 25mm, Z: 5-30mm, T: -5° - +45°, R: 360° (continuous)[1] | — |
| Draw-out door | Max sample size: 150mm diameter[1] | — |
| NIST traceability | — | Yes[2] |
Plan your fab
Building a Metrology & Inspection process? Get a complete equipment list.
Open the fab equipment planner →