Comparison ledger
GCA 6300 DSW, Nikon R10, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 6300 DSWGCA | R10Nikon |
|---|---|---|
| OEM | GCA | Nikon |
| Category | Lithography | Lithography |
| Wafer size | 150mm | 150mm |
| Process node | 5X g-line wafer stepper | — |
| Introduced | — | 1986 |
| Production run | — | 1973–1979 |
| Lifecycle | — | Discontinued |
| Lifecycle milestones | — | 1979 Movie camera business discontinued |
| Control system | — | — |
| Generation | g-line | i-line |
| Family | GCA 6300 DSW | Nikon R10 |
| Cited variants |
| |
| Specifications | ||
| Tool type | 5X g-line wafer stepper[1] | — |
| Exposure wavelength | g-line (436 nm)[1] | — |
| Numerical aperture | 0.30 NA[1] | — |
| Reduction ratio | 5:1[1] | — |
| Variable field size | up to 15 mm square[1] | — |
| Minimum feature size | <0.9 µm[1] | — |
| Wafer accommodation | 3" up to 150 mm; smaller pieces[1] | — |
| Registered alignment | <0.25 µm[1] | — |
| Mask size | 5" x 0.090"-thick masks[1] | — |
| Step and repeat exposure system | laser-controlled stage motion[1] | — |
| Lens | Zeiss lens with 0.30 numerical aperture[1] | Cine Nikkor Zoom, f: 1.4, F: 7-70 mm, zooming ratio 10x[5] |
| Maximum die size | ~15 mm x 15 mm[2] | — |
| Minimum substrate size | ~10 x 10 mm[2] | — |
| Mask plates | 5x5x0.090 inches[2] | — |
| Lens manufacturer | Zeiss (g-line) / Olympus (i-line)[2] | — |
| Lens numerical aperture | 0.30 (g-line)[1] | — |
| Field size | up to 15 mm square (g-line)[1] | — |
| Resolution | <0.9 µm (g-line)[1] | — |
| Alignment accuracy | typically <0.25 µm (g-line)[1] | — |
| Registration tolerance (global) | max 0.30 µm (i-line)[2] | — |
| Registration tolerance (local, DFAS) | max 0.15 µm (i-line)[2] | — |
| Wafer size | 3" to 150 mm (g-line)[1] | — |
| Light source | 350 W Hg arc lamp (i-line)[2] | — |
| Intensity at wafer | ~180 mW/cm² (i-line)[2] | — |
| Depth of field | 1.2 µm for 0.7 µm process (i-line)[2] | — |
| Stage system | laser-controlled stage motion (g-line)[1] | — |
| Autofocus | yes (i-line)[2] | — |
| Exposure type | step and repeat[1] | — |
| Reduction | 5:1[1] | — |
| wafer size | — | 150 mm[4] |
| exposure wavelength | — | i-line (365 nm)[4] |
| introduced | — | 1986[4] |
| technology generation | — | i-line[4] |
| Type | — | Silent super 8 cartridge movie camera[5] |
| Lens optical construction | — | 10-group 14-element zoom lens[3] |
| Focusing | — | Manual, split image; macro focusing yes[5] |
| Zooming | — | Auto with 2 speeds and manual[5] |
| Filter size | — | 67 mm[5] |
| Viewfinder | — | Single-lens reflex with adjustable eyepiece; viewfinder information includes aperture scale[5] |
| Exposure control | — | Auto and manual; TTL Electric Eye; EE lock yes; exposure compensation +/-2 stops[5] |
| Film speed | — | Auto between 10/16 and 400/650 ASA (daylight/tungsten)[5] |
| Filter | — | Built-in 85A filter, coupled with movie light socket[5] |
| Filming speeds | — | 18, 24, 54 fps, single frame[5] |
| Shutter opening angle | — | Variable shutter; positions 0°, 40°, 80° and 160°[5] |
| Fading | — | Auto and manual fade-in/fade-out[5] |
| Rewinding / reverse filming | — | 100 frames approx, double exposure and lap dissolve; reverse filming 100 frames approx[5] |
| Sound | — | Double system, sound recording with synchronized tape recorder[5] |
| Connectors | — | Remote control socket yes; movie light socket Kodak type with filter control; flash synchronization socket yes[5] |
| Power source | — | 6 x AA batteries only; film drive motor DC micromotor[5] |
| Weight | — | 1930 g[5] |
| Dimensions | — | 68 x 260 x 200 mm[5] |
| Tripod socket | — | 1/4"[5] |
| Maker | — | Made in Japan by Nippon Kogaku[5] |
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