Comparison ledger
EV Group 6200 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 6200 MaskEV Group | 1000 FamilyUltratech |
|---|---|---|
| OEM | EV Group | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 6200 | Ultratech 1000 Family |
| Specifications | ||
| Configuration | 3 Stations:[1] | — |
| Power | 1000W light source[1] | — |
| Manufacturer | EV Group[1] | — |
| Model | 6200[1] | — |
| Tool type | Mask Aligner[1] | Photolithography step-and-repeat 1X stepper[3] |
| Wafer sizes | 6, 8 inch[1] | — |
| Stations | 3 Stations[1] | — |
| Wafer handling | 6" Chuck + Mask holder; 8" Chuck + Mask holder[2] | — |
| Light source | 1000W light source[1] | — |
| Alignment | Backside alignment; top view alignment[1] | — |
| Optics | 5x[1] | — |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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