Comparison ledger
EV Group 420 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 420 MaskEV Group | 1000 FamilyUltratech |
|---|---|---|
| OEM | EV Group | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 420 Mask | Ultratech 1000 Family |
| Specifications | ||
| Configuration | Can only align wafers[1] | — |
| Wafer size | 6 inch[1] | — |
| Model designation | EV420[2] | — |
| Alignment capability | Can only align wafers; no exposure optics[1] | — |
| Serial number | AL4/2 011242007[2] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →