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120 Automated Coater ProcessingversusGasonics Gamma 2130 Photoresist Stripper

EV Group 120 Automated Coater Processing, Lam Research Gasonics Gamma 2130 Photoresist Stripper, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMEV GroupLam Research
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 120 Automated Coater ProcessingLam Research Gasonics
Specifications
Configuration50/60 Hz[1]System Configuration:[2]
Phase3 Phase[1]—
Wafer sizes6 inch, 8 inch[1]—
Frequency50/60 Hz[1]—
Wiring configuration4 Wire + GND[1]—
Vintage2015[1]—
Load Port—Brooks Fixload TM V6[2]
EFEM Robot—02-169208-00[2]
Aligner—Yaskawa[2]
RF Rack—Generator ENI GHW-50A-04 5ea[2]
Light Curtain—Keyence[2]
EPD—4ea(#2,#3,#4,#5 Port)[2]
RF Matcher—CPMX-3000 5ea[2]
RF Source—02-352103-00 5ea[2]
HDIS Pedestal—#2, #3, #,1, #6[2]
Fixed Pedestal—#4, #5[2]
Stage #1—Preheat[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing