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Comparison ledger

120 Automated Coater ProcessingversusConcept Three Gamma 2130 Photoresist Stripper

EV Group 120 Automated Coater Processing, Lam Research Concept Three Gamma 2130 Photoresist Stripper, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMEV GroupLam Research
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 120 Automated Coater ProcessingLam Research Concept Three Gamma 2130 Photoresist Stripper
Specifications
Configuration50/60 Hz[1]—
Phase3 Phase[1]—
Wafer sizes6 inch, 8 inch[1]—
Frequency50/60 Hz[1]—
Wiring configuration4 Wire + GND[1]—
Vintage2015[1]2005[2]
Make—Lam / Novellus[2]
Model—Concept Three Gamma 2130[2]
Equipment type—Photoresist Stripper[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing