Waferpedia

Comparison ledger

FPA 5500 iZ+ i-Lineversus1505 G 6 E

Canon FPA 5500 iZ+ i-Line, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCanonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run—1988–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 5500Nikon 1505
Cited variants
  • FPA 5500 iZ+ i-Line Stepperi-line[1]
  • FPA 5500 iZi-line[2]
  • FPA 5500 iZ i-Line[2]
—
Specifications
Configuration350nm[2]5" reticle[4]
MakeCanon[1]Nikon[4]
ModelFPA 5500 iZ+[1]1505 G 6 E[4]
TypeStepper[1]—
i-LineYes[1]—
Wafer Sizes12 inch[3]4 inch[4]
Vintage2004[1]—
Resolution—650 nm[5]
Numerical Aperture—0.54[5]
Reduction—5x[5]
Exposure Field—15 x 15 mm[5]
Alignment Accuracy—130 nm[5]
Wafer Size—4 inch[4]
Light Source—g-line[6]
Introduction Year—1988[5]
NA (Numerical Aperture)—0.54[5]
Category—Stepper[4]
Exposure type—g-line[5]
NA—0.54[5]
Exposure field—9.3 x 18.8 mm[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]inventory listing
  5. [5]web.archive.orgweb.archive.org
  6. [6]ece.utoronto.caece.utoronto.ca