Comparison ledger
Brooks 017-0146-01 Prealigner, GCA AS200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0146-01 PrealignerBrooks | AS200GCA |
|---|---|---|
| OEM | Brooks | GCA |
| Category | Lithography | Lithography |
| Wafer size | — | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | i-line |
| Family | Brooks 017-0146-01 Prealigner | GCA AS200 |
| Specifications | ||
| Model | — | AS200[1] |
| OEM | — | GCA[1] |
| Machine name | — | AutoStep 200 DSW i-line Wafer Stepper[1] |
| Reduction | — | 5X[1] |
| Maximum wafer size | — | up to 200 mm wafers[1] |
| Wafer stage | — | 200 mm Wafer Stage[1] |
| Optics NA | — | 0.45 N.A.[1] |
| Lens | — | Tropel i-line Lens[1] |
| Exposure field | — | 15 mm[1] |
| Alignment | — | uDFAS Die-by-Die Alignment[1] |
| Illumination | — | Annular and Quadrupole illumination available[1] |
| Feature size specification | — | 0.65 µm features[1] |
| Overlay specification | — | <0.125 µm using local alignment[1] |
| Focus repeatability | — | <0.2 µm[1] |
| Automation | — | All operations are automated, including wafer loading, aligning, reticle loading and aligning[1] |
| Wafer leveling | — | Used to provide optimum focus range[1] |
| Automatic calibrations | — | All tool calibrations are performed automatically[1] |
| Focus compensation | — | Compensated for lens heating and barometric shifts[1] |
| Reticle management | — | Reticle Management System (up to 10 reticles)[1] |
| Reduction factor | — | 5X[1] |
| Exposure wavelength | — | i-line[2] |
| Lens numerical aperture | — | 0.45[1] |
| Lens type | — | Tropel i-line lens[1] |
| Exposure field size | — | 15mm[1] |
| Feature resolution specification | — | 0.65µm[1] |
| Sigma (partial coherence) | — | 0.5[1] |
| Wafer handling | — | Automatic wafer handler (set for 100mm wafers)[1] |
| Wafer stage size | — | 200mm Wafer Stage[1] |
| Reticle capacity | — | up to 10 reticles[1] |
| Reticle size | — | 5 inch[1] |
| Illumination modes | — | Annular and Quadrupole illumination available[1] |
| Focus system repeatability | — | <0.2µm[1] |
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