Comparison ledger
Brooks 017-0024-01 Prealigner, EV Group 6200 NT Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0024-01 PrealignerBrooks | 6200 NT MaskEV Group |
|---|---|---|
| OEM | Brooks | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0024-01 Prealigner | EV Group 6200 NT Mask |
| Specifications | ||
| Wafer/substrate size | — | up to 200 mm / 8"[1] |
| Top side alignment accuracy | — | ≤ ± 0.5 µm[2] |
| Bottom side alignment accuracy | — | ≤ ± 1.0 µm[2] |
| IR alignment accuracy | — | ≤ ± 2.0 µm[2] |
| Exposure source | — | Mercury light source / UV LED light source[1] |
| Exposure modes | — | Hard, Soft, & Vacuum Contact; Proximity[3] |
| Proximity exposure gap range | — | 0 - 300 µm adjustable via software[3] |
| Wafer thickness | — | 0.1 - 10 mm (Top Side)[3] |
| Mask size | — | up to 9"[2] |
| Substrate/wafer size (max) | — | 200 mm[2] |
| Footprint | — | 1.95 m²[2] |
| Height | — | 2.10 m[2] |
| Weight | — | ~ 980 kg[2] |
| Throughput (first print) | — | 180 wafers per hour[1] |
| Throughput (aligned) | — | 140 wafers per hour[1] |
| Wedge compensation | — | Fully automatic - SW controlled[1] |
| Resolution (SmartNIL) | — | ≤ 40 nm[4] |
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