Comparison ledger
Brewer Science B2, OAI 808-Aligner-Tool-Procedu, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | B2Brewer Science | |
|---|---|---|
| OEM | Brewer Science | OAI |
| Category | Lithography | Lithography |
| Wafer size | 100mm | 100mm |
| Process node | DUV | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brewer Science B2 | OAI 808-Aligner-Tool-Procedu |
| Specifications | ||
| Type | Developable BARC[1] | semi-automated, four-camera, optical front- and backside mask aligner[2] |
| Name in ACT-8 process list | B2 DUV42P[1] | — |
| Configured wafer size on ACT-8 | 100 mm (4") wafers[1] | — |
| Model | — | OAI Model 800 Mask Aligner[2] |
| Automation | — | Semi-automated[2] |
| Camera count | — | Four-camera[2] |
| Alignment type | — | Optical front- and backside mask aligner[2] |
| Alignment accuracy | — | 1 µm to 2 µm[2] |
| Backside focus | — | Motorized[2] |
| Auto leveling | — | Motorized[2] |
| Gap setting | — | Auto gap setting[2] |
| Supported piece size | — | 2", 100mm, 150mm, 200mm, pieces[2] |
| Thickness range | — | 0.1–10 mm[2] |
| Mask size | — | 4"x4"; 5"x5"; 7"x7"; 9"x9"[2] |
| Top side alignment | — | ± 1.0 µm 3σ[2] |
| Bottom side alignment | — | ± 1.25 µm 3σ[2] |
| Large gap alignment | — | Option / ± 1.5 µm 3σ[2] |
| Resolution | — | Vacuum + Hard Contact ≤ 1 µm; Hard Contact ≤ 1.5 µm; Soft Contact ≤ 2.0 µm; Proximity ≥ 3.0 µm[2] |
| Exposure wavelength | — | 350–450 nm[2] |
| Lamp | — | Mercury arc lamp, 350 W[2] |
| Motorized backside focus | — | yes[2] |
| Motorized auto leveling | — | yes[2] |
| Auto gap setting | — | yes[2] |
| Size | — | 2 in, 100 mm, 150 mm, 200 mm[2] |
| Thickness | — | 0.1-10 mm[2] |
| Mercury arc lamp | — | 350 W[2] |
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