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Comparison ledger

200 ACUversusCKX 1000 Ion Beam

Axcelis 200 ACU, Oxford Instruments CKX 1000 Ion Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 ACUAxcelis
CKX 1000 Ion BeamOxford Instruments
OEMAxcelisOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Oxford Instruments CKX 1000 Ion Beam
Specifications
ConfigurationParts Machine[1]Includes Turbo molecular pump & Edwards backing pump[5]
ManufacturerAxcelis[1]Oxford Instruments[6]
Model200 ACU[1]CKX 1000 Ion Beam[5]
Tool typeAsher[1]—
Wafer size200mm[3]—
Serial numberAU6A356AH[3]—
Computer systemM 200 PC, M 200[4]—
Part numberSC 4572 A[4]—
Volts208[4]—
Amps30[4]—
Equipment typeAsher[1]—
Wafer configuration8 inch[2]—
Category—Etch[6]
Ion source—11 cm ion source[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]wotol.comwotol.com
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]inventory listing
  6. [6]waferpedia.comwaferpedia.com