Comparison ledger
ASML PAS 2500, EV Group 101, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PAS 2500ASML | 101EV Group |
|---|---|---|
| OEM | ASML | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1985– | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1985 Introduction · 1986 Machine year | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 2500 | EV Group 101 |
| Cited variants | — | |
| Specifications | ||
| Wafer size (base model) | 5 inches[3] | — |
| Resolution (PAS 2500/10) | 900 nm[1] | — |
| Overlay accuracy (PAS 2500/10) | 250 nm[1] | — |
| Throughput (PAS 2500/10) | 66 wafers per hour (150 mm)[1] | — |
| Wafer size (PAS 2500/40) | 150 mm (6 inches)[2] | — |
| Reticle masking (PAS 2500/40) | Four independent blades; full field of travel[2] | — |
| Alignment system (PAS 2500/40) | Dual automatic through-the-lens using diffraction grating marks directly referenced to reticle alignment system[2] | — |
| Illumination system (PAS 2500/40) | Elliptical mirror and fly's eye integrator[2] | — |
| Position control (PAS 2500/40) | Three axis HP laser interferometer system[2] | — |
| Model | PAS 2500[3] | 101[4] |
| Wafer size | 5 inch[3] | — |
| Line width | 900 nanometers[1] | — |
| Layer placement accuracy | 250 nanometers[1] | — |
| Production capacity | 66 wafers of 150 millimeters per hour[1] | — |
| OEM | — | EV Group[4] |
| Equipment name | — | EVG 101 Spray Coater[4] |
| NEMO ID | — | evgspraycoat[4] |
| Training required | — | EVG 101 Training[4] |
| Training duration | — | 1.50 hours[4] |
| Processing technique | — | Resist Spray Coat (manual)[4] |
| Cleanliness | — | "All"[4] |
| Location | — | SNF Paul G Allen L107 Cleanroom[4] |
| Wafer diameter (substrate size) | — | up to 300 mm[5] |
| Available modules | — | Spin coat / OmniSpray® / develop[5] |
| Wafer handling options | — | Bowed / warped / thin wafer handling, edge handling[5] |
| Dispense options | — | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[5] |
| Processing technique (at SNF) | — | Resist Spray Coat (manual)[6] |
| Cleanliness group (at SNF) | — | "All"[4] |
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