Comparison ledger
Applied Materials xR 200 S, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | xR 200 SApplied Materials | 160 XPVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials xR 200 S | Varian 160 XP |
| Cited variants |
| |
| Specifications | ||
| Phase | 3 Phase[3] | — |
| Configuration | 50/60 Hz[3] | — |
| Last Wafer Processed | May 2024[4] | — |
| OEM | Applied Materials[3] | — |
| Model | xR 200 S[3] | — |
| Category | Ion Implantation[4] | — |
| Wafer Sizes | 8 inch[3] | — |
| Power | 3 Phase[4] | — |
| Frequency | 50/60 Hz[3] | — |
| Vacuum | Cryo pump[4] | — |
| Gas delivery | Gas cylinders removed[4] | — |
| Gas lines and beamline | Purged with N2[3] | — |
| Includes Spare Parts | 3 spare sources; 2 bushings; 3 MRS (Mass Revolving System); 2 source housing; Flight tube; Many parts for source maintenance and tool maintenance[3] | — |
| Wafer Size | 8 inch[3] | — |
| Power Phase | 3 Phase[3] | — |
| Power Frequency | 50/60 Hz[3] | — |
| Automation | Fully Automated[3] | — |
| Vintage | 2003[3] | — |
| Vacuum Pump | Cryo pump[3] | — |
| Gas Delivery | Gas cylinders removed; gas lines and beamline purged with N2[3] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[2] |
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