Comparison ledger
Applied Materials Reflexion 3600, Nova V 2600, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Reflexion 3600Applied Materials | V 2600Nova |
|---|---|---|
| OEM | Applied Materials | Nova |
| Category | CMP | CMP |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Reflexion | Nova V 2600 |
| Specifications | ||
| CE Segregation (NonCu/Open/Cu) | Cu[2] | — |
| Configuration | SW version:[2] | Integrated CMP Endpoint / Film Measurement[3] |
| Reflexion Software | PB59M3i2[2] | — |
| MESA software | CB22M3i2[2] | — |
| ISRM software | IB11g5b[2] | — |
| FI robot type / controller | Kawasaki[2] | — |
| Load port | TDK TAS 300 (2)[2] | — |
| FI controller | AMAT VMICPCI-7326[2] | — |
| Wet robot type | Yaskawa WTM511-2-FWS02-V1-CU/0190-08246 (1)[2] | — |
| Polisher MEI B/D | AMAT 0100-00722 (3)[2] | — |
| Polisher AIO B/D | AMAT 0100-00396 (2)[2] | — |
| Polisher DIO B/D | AMAT 0100-01995 (7)[2] | — |
| Platen Driver | Yaskawa SGDH-75 AE (3)[2] | — |
| Cross Driver | Yaskawa SGDH-08 AE-S (1)[2] | — |
| Pad Conditioner/HCLU Driver | Yaskawa SGDH-01 AE (7)[2] | — |
| Head SWEEP Driver | Yaskawa SGDH-04 AE (4)[2] | — |
| Head Rotation Driver | SE 2 VOSTARCD CR 06250 (4)[2] | — |
| Meg Generator | Kaijo 600 (1)[2] | — |
| Mega Heater | Orion ETD 232-SA-A-UL (1)[2] | — |
| Slurry arm Type | AMAT 0040-78378 (3)[2] | — |
| Make | Applied Materials[2] | — |
| Model | Reflexion 3600[2] | — |
| Category | CMP (Chemical Mechanical Polisher)[2] | — |
| CE Segregation | Cu[2] | — |
| PC Arm assembly | AMAT 0010-25311 (3)[2] | — |
| iScan EndPoint module | AMAT 0010-37905[2] | — |
| Vintage | 2011[2] | — |
| Wafer Size | — | 12 inch[1] |
| Integrated System | — | CMP Endpoint / Film Measurement[3] |
| Integrated CMP Endpoint / Film Measurement | — | Yes[1] |