Waferpedia

Comparison ledger

Mirra 3400versus72

Applied Materials Mirra 3400, Lapmaster 72, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: CMP, null[1]
Side-by-side comparison of selected equipment models
Attribute
Mirra 3400Applied Materials
72Lapmaster
OEMApplied MaterialsLapmaster
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1998 Vintage · 2001 Vintage—
Control system——
Generation——
FamilyApplied Materials MirraLapmaster 72
Cited variants
  • Mirra 3400 Stand-Alone[2]
  • Model 72 Open Face Flat Polishing Machine[3]
  • Model 72 Polisher[4]
  • 72" Lapmaster, Open-Face, (4) 27" ID Rings, 5-32 RPM, 25HP, Slurry System, 2001[1]
  • Open Face (OF)[5]
  • Pneumatic Lift (PL)[5]
  • Model 72 Open Face[5]
  • Model 72 Pneumatic Lift[3]
Specifications
Cassette Que4 Wet[6]—
HandlingWet In / Wet Out[6]—
Platens3[6]—
Polish Heads4[6]—
Slurry DeliveryRotary pump (6)[6]—
Slurry ConfigurationAB, AB w/ Position Sensor[6]—
Slurry Delivery Arm TypeExtended w/ 4 Outputs[6]—
ISRM P 1iScan / Full Scan/M. Torque[6]—
ISRM P 2Full Scan/M. Torque[6]—
ISRM P 3Full Scan/M. Torque[6]—
UPAIT / RR / MEM[6]—
UPA SupplyNitrogen Gas[6]—
Head TypesTitan I[6]—
Pad ConditionerDDF 3[6]—
Min / Max Platen Speed0 -125 rpm[6]—
Min / Max Slurry Flow15 - 400 ml/mn[6]—
Min / Max Head pressure0.7 - 14 psi[6]—
Min / Max PC Downforce3.0 - 17 lbf[6]—
Endpoint SoftwareIB 11 J 1[6]—
Polisher Softwaremp 2 B 6.2_36[6]—
Wafer sizes150 mm, 200 mm (6 inch, 8 inch)[6]—
Number of platens3[6]—
Number of polish heads4[6]—
Head typeTitan I[6]—
Platen speed range0 – 125 rpm[6]—
Slurry flow rate range15 – 400 ml/min[6]—
Head pressure range0.7 – 14 psi[6]—
PC downforce range3.0 – 17 lbf[6]—
Handling typeWet In / Wet Out[6]—
Operating systemWindows NT 4.00.1381 or above[2]—
Electrical requirements200/208 VAC, 200 A, 45 kVA[7]—
Endpoint software versionIB 11 J 1[6]—
Polisher software versionmp 2 B 6.2_36[6]—
Number of polishing heads4[6]—
Min/Max slurry flow15 - 400 ml/min[6]—
Polisher softwaremp 2 B 6.2_36 / MB60a1 or above[6]—
Line voltage200/208 VAC[2]—
Line frequency50 Hz[2]—
Circuit breaker rating200 A[2]—
SECS/GEM interfaceYes[2]—
Hard drive configurationDual hard disk, XP / 68 pin SCSI[6]—
Memory128 MB or above[2]—
CPUPentium III or above[2]—
ManufacturerApplied Materials[6]—
ModelMirra 3400[6]72[4]
CategoryCMP[8]—
Wafer size200 mm[2]—
Version200 mm[2]Open Face[3]
Vintage1998[8]—
ConfigurationStand-Alone Oxide/STI CMP[2]27" ID Rings[4]
Voltage—480 V[4]
Plate Diameter—72 inches (1829 mm)[5]
Number of Conditioning Rings—4[3]
Ring Inside Diameter—27.25 inches (692 mm)[5]
Standard RPM—30[5]
RPM Range (Variable Speed Drive)—5–32[5]
Drive Motor (Lapper)—20 HP / 15 kW[5]
Drive Motor (alternate listing)—25 HP[1]
Working Height—36 inches (914 mm)[5]
Dimensions (Open Face)—100 inches x 110 inches x 63 inches (2540 mm x 2794 mm x 1600 mm)[5]
Dimensions (Pneumatic Lift)—124 inches x 110 inches x 108 inches (3150 mm x 2794 mm x 2743 mm)[5]
Est. Shipping Weight (Open Face)—15,000 lbs (6804 kg)[5]
Est. Shipping Weight (Pneumatic Lift)—20,000 lbs (9072 kg)[5]
Ring Height—4.0 inches[1]
Plate Thickness—1-5/8 inches[1]
Machine type—Polisher[4]
Plate diameter—72 in[5]
Conditioning rings—4[3]
Ring ID—27.25 in[5]
Ring size—27" ID rings[4]
Speed range—5-32 RPM[4]
RPM range with variable speed drive—5-32[5]
Drive motor—25 HP[4]
Overall dimensions, Open Face—100 in x 110 in x 63 in H[5]
Weight, Open Face—15,000 lbs[5]
Serial number—7200010[1]
Year stated in source—2001[1]

Plan your fab

Building a CMP process? Get a complete equipment list.

Open the fab equipment planner →
Sources (8)Every fact above is drawn from these public sources
  1. [1]libertymachinery.comlibertymachinery.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]lapmaster-wolters.co.uklapmaster-wolters.co.uk
  4. [4]Equipment inventory listing
  5. [5]web.archive.orgweb.archive.org
  6. [6]inventory listing
  7. [7]smtnet.comsmtnet.com
  8. [8]Equipment inventory listing