Comparison ledger
Applied Materials Endura HP, Denton Vacuum Discovery, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Endura HPApplied Materials | DiscoveryDenton Vacuum |
|---|---|---|
| OEM | Applied Materials | Denton Vacuum |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Endura | Denton Vacuum Discovery |
| Cited variants | — | |
| Specifications | ||
| Voltage | 208 VAC[4] | — |
| Configuration | 50/60 Hz[4] | With Lipon Deposition[5] |
| Full Load Current | 416 A[4] | — |
| Maximum System Rating | 150 KVA[4] | — |
| Ampere Rating of Largest Load | 200 A[4] | — |
| Interrupt Current | 10,000 AMPS I.C.[4] | — |
| Power | 208 VAC[4] | — |
| Frequency | 50/60 Hz[4] | — |
| Version | 200 MM[1] | — |
| Vintage | 01.06.2005[1] | — |
| Technology | — | Magnetron sputtering[6] |
| Substrate Size (Discovery 200) | — | Up to 200 mm[2] |
| Substrate Size (Discovery 300) | — | Up to 300 mm[2] |
| Cathode Configuration (Discovery 200) | — | Up to four 4" diameter confocal sources[2] |
| Cathode Configuration (Discovery 300) | — | Up to three 6" diameter confocal sources[2] |
| Power Supply | — | DC, RF, Pulsed DC[2] |
| Vacuum | — | Cryo/Turbo[2] |
| Substrate Bias | — | RF bias with dedicated power supply and auto matching network[2] |
| Plasma Emission Monitor | — | Yes (Discovery 200/300), No (Discovery V), Yes (Discovery I)[2] |
| Coating Uniformity (Discovery 200/300) | — | < +/-5%[2] |
| Coating Uniformity (Discovery V) | — | < +/-2%[2] |
| Coating Uniformity (Discovery I) | — | < +/-0.25%[2] |
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